SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 534, Issue , 2013, Pages 367-372

SiNx thickness dependent morphology and mechanical properties of CrAlN/SiNx nanomultilayers

(8) Li, Wei a Liu, Ping a Zhao, Yongsheng a Zhang, Ke b Ma, Fengcang a Liu, Xinkuan a Chen, Xiaohong a He, Daihua a

a UNIVERSITY OF SHANGHAI FOR SCIENCE AND TECHNOLOGY (China)

b SHANGHAI JIAO TONG UNIVERSITY (China)

Author keywords

Microstructure; Multilayers; Nitrides; Sputtering; Superlattices; Thermodynamic modeling; Thin films; X ray diffraction

Indexed keywords

HARDNESS AND ELASTIC MODULUS; MICRO-STRUCTURE EVOLUTIONS; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NANOINDENTATION TECHNIQUES; REACTIVE MAGNETRON SPUTTERING; THERMODYNAMIC MODELING; THICKNESS DEPENDENT MORPHOLOGIES; X RAY DIFFRACTION LINE PROFILE ANALYSIS;

ELASTIC MODULI; EPITAXIAL GROWTH; FILM PREPARATION; HARDNESS; INDENTATION; MICROSTRUCTURE; MULTILAYERS; NITRIDES; SPUTTERING; SUPERLATTICES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SILICON NITRIDE;

EID: 84876675908 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2013.02.049 Document Type: Article

Times cited : (27)

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