Fabrication of TiO2 nano-to-microscale structures using UV nanoimprint lithography

Nanotechnology

Volumn 24, Issue 19, 2013, Pages

  Choi, Je Hong ^a   Jo, Han Byeol ^a   Choi, Hak Jong ^a   Lee, Heon ^a  

^a Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FLEXIBLE SUBSTRATE; HIGH ASPECT RATIO; NANO-SCALED STRUCTURES; NANOPARTICLE CONCENTRATIONS; TIO2 NANO-PARTICLES; UV-NANOIMPRINT LITHOGRAPHY; UV-VIS SPECTROPHOTOMETRY; VARIOUS SUBSTRATES;

ASPECT RATIO; FABRICATION; NANOPARTICLES; REFRACTIVE INDEX; RESINS; SILICON WAFERS;

NANOIMPRINT LITHOGRAPHY;

EID: 84876503849     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/19/195301     Document Type: Article

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