Damage investigation on tungsten and diamond diffractive optics at a hard x-ray free-electron laser

Optics Express

Volumn 21, Issue 7, 2013, Pages 8051-8061

  Uhlén, Fredrik ^a   Nilsson, Daniel ^a   Holmberg, Anders ^a   Hertz, Hans M ^a   Schroer, Christian G ^b   Seiboth, Frank ^b   Patommel, Jens ^b   Meier, Vivienne ^b   Hoppe, Robert ^b   Schropp, Andreas ^c   Lee, Hae Ja ^c   Nagler, Bob ^c   Galtier, Eric ^c   Krzywinski, Jacek ^c   Sinn, Harald ^d   Vogt, Ulrich ^a  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^d EUROPEAN XFEL GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FREE ELECTRON LASERS; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; TUNGSTEN;

DAMAGE INVESTIGATION; DAMAGE THRESHOLD; FOCUSING OPTICS; GRAPHITIZATION PROCESS; MECHANICAL CHARACTERS; RAMAN ANALYSIS; STRESS VARIATIONS; X RAY BEAM;

X RAYS;

DIAMOND; TUNGSTEN;

ARTICLE; CHEMISTRY; EQUIPMENT; EQUIPMENT DESIGN; EQUIPMENT FAILURE; LASER; OPTICAL INSTRUMENTATION; RADIATION DOSE; RADIATION EXPOSURE; REFRACTOMETRY; X RAY;

DIAMOND; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LASERS; LENSES; RADIATION DOSAGE; REFRACTOMETRY; TUNGSTEN; X-RAYS;

EID: 84875987203     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.21.008051     Document Type: Article

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