New diamond nanofabrication process for hard x-ray zone plates

Journal of Vacuum Science and Technology B

Volumn 29, Issue 6, 2011, Pages

  Uhlén, Fredrik ^a   Lindqvist, Sandra ^a   Nilsson, Daniel ^a   Reinspach, Julia ^a   Vogt, Ulrich ^a   Hertz, Hans M ^a   Holmberg, Anders ^a   Barrett, Ray ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DIAMONDS; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; FREE ELECTRON LASERS; NANOTECHNOLOGY; PLATES (STRUCTURAL COMPONENTS);

DRY ETCH PROCESS; HIGH ASPECT RATIO; HIGH BRIGHTNESS; IMAGING PROPERTIES; NANOFABRICATION PROCESS; SCANNING MICROSCOPE; TRI-LAYER RESISTS; X-RAY FREE ELECTRON LASERS;

X RAYS;

EID: 84255168525     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3656055     Document Type: Article

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