Sputtered ITO for application in thin-film silicon solar cells: Relationship between structural and electrical properties

Applied Surface Science

Volumn 269, Issue , 2013, Pages 81-87

  Hotovy, J ^a,b   Hupkes J ^a   Bottler W ^a   Marins, E ^a,c   Spiess, L ^d   Kups, T ^d   Smirnov, V ^a   Hotovy, I ^b   Kovac J ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^c UNIVERSITY OF MINHO   (Portugal)

^d ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electrical properties; Hall mobility; ITO; Microstructure; Nip solar cell; Surface morphology; c Si:H

Indexed keywords

ELECTRIC PROPERTIES; HALL MOBILITY; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROCRYSTALLINE SILICON; MICROSTRUCTURE; OPTICAL PROPERTIES; OXIDE FILMS; SOLAR CELLS; SUBSTRATES; SURFACE MORPHOLOGY; TEMPERATURE; THIN FILM SOLAR CELLS; THIN FILMS; TIN OXIDES;

DIFFERENT SURFACE MORPHOLOGIES; ELECTRICAL AND OPTICAL PROPERTIES; INDIUM TIN OXIDE THIN FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING; RIGID AND FLEXIBLE SUBSTRATES; STRUCTURAL AND ELECTRICAL PROPERTIES; SUBSTRATE TEMPERATURE; THIN-FILM SILICON SOLAR CELLS;

SILICON SOLAR CELLS;

EID: 84875477774     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.10.180     Document Type: Conference Paper

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