Characterization of sputtered NiO films using XRD and AFM

Journal of Materials Science

Volumn 39, Issue 7, 2004, Pages 2609-2612

  Hotovy, I ^a   Huran, J ^b   Spiess, L ^c  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^c ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC MATERIALS; APPROXIMATION THEORY; ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; MICROSTRUCTURE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SENSORS; SPUTTERING; THIN FILMS; X RAY DIFFRACTION;

INERT FLOW; REACTIVE SPUTTERING;

NICKEL COMPOUNDS;

EID: 1842665817     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000020040.77683.20     Document Type: Article

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