Fabrication and photocatalytic properties of silicon nanowires by metal-assisted chemical etching: Effect of H2O2 concentration

Nanoscale Research Letters

Volumn 7, Issue 1, 2012, Pages 1-9

  Liu, Yousong ^a   Ji, Guangbin ^a   Wang, Junyi ^a   Liang, Xuanqi ^a   Zuo, Zewen ^b   Shi, Yi ^c  

^a NANJING UNIVERSITY OF AERONAUTICS AND ASTRONAUTICS   (China)

^b ANHUI NORMAL UNIVERSITY   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

Photocatalytic properties; Silicon nanowire arrays

Indexed keywords

ETCHING; HYDROFLUORIC ACID; MONOCRYSTALLINE SILICON; NANOWIRES; ORGANIC POLLUTANTS; PHOTOCATALYTIC ACTIVITY; RHODIUM COMPOUNDS; SILICON WAFERS;

ETCHING SOLUTIONS; HYDROGEN PEROXIDE CONCENTRATION; METAL-ASSISTED CHEMICAL ETCHING; PHOTOCATALYTIC PROPERTY; PHOTOELECTRIC PROPERTY; SILICON NANOWIRE ARRAYS; SILICON NANOWIRES; SURFACE CHARACTERISTICS;

BORON COMPOUNDS;

EID: 84875328589     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-7-663     Document Type: Article

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