Sub-100 nm Si nanowire and nano-sheet array formation by MacEtch using a non-lithographic InAs nanowire mask

Nanotechnology

Volumn 23, Issue 30, 2012, Pages

  Shin, Jae Cheol ^a   Zhang, Chen ^a   Li, Xiuling ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAY FORMATION; CATALYST-FREE; FORMATION PROCESS; HIGH YIELD; INAS; METAL PATTERNING; SHAPE AND SIZE; SI NANOWIRE; SI SUBSTRATES; SUB-100 NM; ULTRATHIN SILICON;

ASPECT RATIO; EPITAXIAL GROWTH; INDIUM ARSENIDE; NANOSHEETS; NANOWIRES; ORGANIC CHEMICALS;

SILICON;

EID: 84863679001     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/30/305305     Document Type: Article

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