Experimental study of design parameters in silicon micropillar array solar cells produced by soft lithography and metal-assisted chemical etching

IEEE Journal of Photovoltaics

Volumn 2, Issue 2, 2012, Pages 129-133

  Shin, Jae Cheol ^a   Chanda, Debashis ^b   Chern, Winston ^a   Yu, Ki Jun ^a   Rogers, John A ^b   Li, Xiuling ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

Etching; nanopatterning; photovoltaic cells; semiconductor nanostructures

Indexed keywords

ABSORPTION RATES; CORE-SHELL; DESIGN PARAMETERS; EXPERIMENTAL STUDIES; GEOMETRICAL DESIGNS; LOSS MECHANISMS; METAL-ASSISTED CHEMICAL ETCHING; MICRO-PILLARS; NANOPATTERNING; P-N JUNCTION; PILLAR ARRAYS; PILLAR DIAMETERS; SEMICONDUCTOR NANOSTRUCTURES; SOFT LITHOGRAPHY; SURFACE RECOMBINATIONS; THIN MEMBRANE; TOTAL SURFACE AREA;

NANOWIRES; PHOTOVOLTAIC CELLS; SEMICONDUCTOR JUNCTIONS; SOLAR CELLS;

ETCHING;

EID: 84865169147     PISSN: 21563381     EISSN: None     Source Type: Journal    
DOI: 10.1109/JPHOTOV.2011.2180894     Document Type: Article

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