Effect of rapid thermal annealing on texture and properties of pulsed laser deposited zinc oxide thin films

Materials Letters

Volumn 98, Issue , 2013, Pages 149-152

  Sekhar, K C ^a   Levichev, S ^a   Kamakshi, Koppole ^a   Doyle, S ^b   Chahboun, A ^a,c   Gomes, M J M ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^c ABDELMALEK ESSAADI UNIVERSITY   (Morocco)

Author keywords

Electrical properties; Grazing incidence x ray diffraction; Photoluminescence; Rapid thermal annealing; ZnO thin films

Indexed keywords

COMPARATIVE STUDIES; GRAZING INCIDENCE X-RAY DIFFRACTION; HIGH-RESISTANCE STATE; LOW-RESISTANCE STATE; PHOTOLUMINESCENCE SPECTRUM; PREFERRED ORIENTATIONS; SPACE CHARGE LIMITED CURRENTS; ZNO THIN FILM;

DEPOSITS; ELECTRIC PROPERTIES; METALLIC FILMS; OPTICAL FILMS; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; TEXTURES; X RAY DIFFRACTION;

RAPID THERMAL ANNEALING;

EID: 84875155826     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2013.02.032     Document Type: Article

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