Structure, morphology, and optical properties of amorphous and nanocrystalline gallium oxide thin films

Journal of Physical Chemistry C

Volumn 117, Issue 8, 2013, Pages 4194-4200

  Kumar, S Sampath ^a   Rubio, E J ^a   Noor A Alam, M ^a   Martinez, G ^a   Manandhar, S ^b   Shutthanandan, V ^b   Thevuthasan, S ^b   Ramana, C V ^a  

^a 500 W University Avenue   (United States)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ENERGY GAP; GALLIUM COMPOUNDS; MORPHOLOGY; NANOCRYSTALS; OPTICAL PROPERTIES; OXIDE FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTROMETRY; THIN FILMS; X RAY DIFFRACTION;

ENERGY DISPERSIVE X-RAY SPECTROMETRIES (EDS); INCREASING TEMPERATURES; LOWER TEMPERATURES; RUTHERFORD BACKSCATTERING SPECTROMETRY; SPECTRAL TRANSMISSION; SPECTROPHOTOMETRIC MEASUREMENTS; STRUCTURAL CHARACTERISTICS; SUBSTRATE TEMPERATURE;

OPTICAL FILMS;

EID: 84874623387     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp311300e     Document Type: Article

References (40)

1. Orita, M.; Ohta, H.; Hirano, M.; Hosono, H. Appl. Phys. Lett. 2000, 77, 4166-4168
2. Mohamed, M.; Janowitz, C.; Unger, I.; Manzke, R.; Galazka, Z.; Uecker, R.; Fornari, R.; Weber, J. R.; Varley, J. B.; Van de Walle, C. G. Appl. Phys. Lett. 2010, 97, 211903-1-211903-3
3. Hu, J. Q.; Li, Q.; Meng, X. M.; Lee, C. S.; Lee, S. T. J. Phys. Chem. B 2002, 106, 9536-9539
4. Ueda, N.; Hosono, H.; Waseda, R.; Kawazoe, H. Appl. Phys. Lett. 1997, 70, 3561-3563
5. Lovejoy, T. C.; Yitamben, E. N.; Shamir, N.; Morales, J.; Villora, E. G.; Shimamura, K.; Zheng, S.; Ohuchi, F. S.; Olmstead, M. A. Appl. Phys. Lett. 2009, 94, 081906-1-081906-3
6. King, P. D. C.; McKenzie, I.; Veal, T. D. Appl. Phys. Lett. 2010, 96, 062110-1-062110-3
7. Minami, T.; Nakatani, T.; Miyata, T. J. Vac. Sci. Technol. A 2000, 18, 1234-1238
8. Fleischer, M.; Meixner, H. Sens. Actuators, B 1995, 26-27, 81-84
9. Ogita, M.; Saika, N.; Nakanishi, Y.; Hatanaka, Y. Appl. Surf. Sci. 1999, 142, 188-191
10. Bartic, M.; Baban, C.-I.; Suzuki, H.; Ogita, M.; Isai, M. J. Am. Ceram. Soc. 2007, 90, 2879-2884
11. Jiang, H.; Chen, Y.; Zhou, Q.; Su, Y.; Xiao, H.; Zhu, L. Mater. Chem. Phys. 2007, 103, 14-17
12. Bhosle, V.; Prater, J. T.; Fan Yang, Burk, D.; Forrest, S. R.; Narayan, J. J. Appl. Phys. 2007, 102, 023501-1-023501-5
13. Varley, J. B.; Weber, J. R.; Janotti, A.; Van de Walle, C. G. Appl. Phys. Lett. 2010, 97, 142106-1-142106-3
14. He, H.; Orlando, R.; Blanco, M. A.; Pandey, R. Phys. Rev. B. 2006, 74, 195123-1-195123-8
15. Rebien, M.; Henrion, W.; Hong, M.; Mannaerts, J. P.; Fleischer, M. Appl. Phys. Lett. 2002, 81, 250-252
16. Ji, Z.; Du, J.; Fan, J.; Wang, W. Opt. Mater. 2006, 28, 415-417
17. Litimein, F.; Rached, D.; Khenata, R.; Baltache, H. J. Alloys Compd. 2008, 488, 148-156
18. Roy, R.; Hill, V. G.; Obson, E. F. J. Am. Chem. Soc. 1952, 74, 719-722
19. Takakura, K.; Koga, D.; Ohyama, H.; Rafi, J.vM.; Kayamoto, Y.; Shibuya, M.; Yamamoto, H.; Vanhellemont, J. Phys, B 2009, 404, 4854-4857
20. Geller, S. J. Chem. Phys. 1960, 33, 676-684
21. Janowitz, C.; Scherer, V.; Mohamed, M.; Krapf, A.; Dwelk, H.; Manzke, R.; Galazka, Z.; Uecker, R.; Irmscher, K.; Fornari, R. New J. Phys. 2011, 13, 085014-1-085014-14
22. Binet, L.; Gourier, D.; Minot, C. J. Solid State Chem. 1994, 113, 420-433
23. Bermudez, V. M. Chem. Phys. 2006, 323, 193-203
24. Kim, H.; W.; Kim, N.; H. Mater. Sci. Eng. B 2004, 110, 34-37
25. Ou, S.; Wuu, D.; Fu, Y.; Liu, S.; Horng, R.; Liu, L.; Feng, Z. Mater. Chem. Phys. 2012, 133, 700-705
26. Baban, C.; Toyoda, Y.; Ogita, M. Thin Solid Films 2005, 485, 369-373
27. Guzman-Navarro, G.; Herrera-Zaldivar, M.; Valenzuela-Benavides, J.; Maestre, D. J. Appl. Phys. 2011, 110, 034315-034315-5
28. Feltz, A.; Gamsjager, E. J. Eur. Ceram. Soc. 1998, 18, 2217-2226
29. SIMNRA is a Microsoft Windows program for the simulation of backscattering spectra for ion beam analysis with MeV ions. Additional details can be found in: Mayer, M. SIMNRA User's Guide, Technical Report IPP 9/113; Max- Planck-Institut fur Plasmaphysik: Garching, Germany, 1997.
30. Ramana, C. V.; Smith, R. J.; Hussain, O. M.; Chusuei, C. C.; Julien, C. M. Chem. Mater. 2005, 17, 1213-1219
31. Mudavakkat, V. H.; Atuchin, V. V.; Kruchinin, N.; Kayani, A.; Ramana, C. V. Opt. Mater. 2012, 34, 893-900
32. Kittel, C. Introduction to Solid State Physics; Wiley: New York, 1968.
33. Gullapalli, S. K.; Vemuri, R. S.; Manciu, F. S.; Enriquez, J. L.; Ramana, C. V. J. Vac. Sci. Technol. A 2010, 28, 824-828
34. Ramana, C. V.; Ait-Salah, A.; Utsunomiay, S.; Gendron, F.; Mauger, A.; Julien, C. M. Chem. Mater. 2007, 19, 5319-5324
35. Ramana, C. V.; Ait-Salah, A.; Utsunomiay, S.; Gendron, F.; Mauger, A.; Julien, C. M. J. Phys. Chem. C 2007, 111, 1049-1054
36. Sinha, G.; Adhikary, K.; Chaudhuri, S. J. Cryst. Growth 2005, 276, 204-207
37. Gullapalli, S. K.; Vemuri, R. S.; Ramana, C. V. Appl. Phys. Lett. 2010, 96, 171903-1-171903-3
38. Tyagi, P.; Vedeshwar, A. G. Phys. Rev. B 2002, 66, 075422-1-075422-8
39. Tan, S. T.; Chen, B. J.; Sun, X. W.; Fan, W. J.; Kwok, H. S.; Zhang, X. H.; Chua, S. J. J. Appl. Phys. 2005, 98, 013505-1-013505-5
40. Rastogi, A. C.; Sharma, S. N.; Kohli, S. Semicond. Sci. Technol. 2000, 15, 1011-1021