Tungsten oxide (WO3) thin films for application in advanced energy systems

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 824-828

  Gullapalli, S K ^a   Vemuri, R S ^a   Manciu, F S ^b   Enriquez, J L ^b   Ramana, C V ^a  

^a 500 W University Avenue   (United States)

^b UNIVERSITY OF TEXAS AT EL PASO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED ENERGY SYSTEMS; EFFECT OF TEMPERATURE; HIGHER TEMPERATURES; NANOCRYSTALLINES; RADIO FREQUENCIES; ROOM TEMPERATURE; SEM; SENSOR DEVELOPMENT; TUNGSTEN OXIDE; XRD;

AMORPHOUS FILMS; CARBONIZATION; COAL; COAL GASIFICATION; COAL INDUSTRY; DEPOSITION; GAS GENERATORS; GAS PRODUCERS; GROWTH TEMPERATURE; HYDROGEN SULFIDE; MAGNETRONS; MICROSTRUCTURE; OXIDES; SCANNING ELECTRON MICROSCOPY; SENSORS; THIN FILMS; TUNGSTEN; TUNGSTEN COMPOUNDS; VAPOR DEPOSITION; X RAY DIFFRACTION;

COAL GASIFICATION PLANTS;

EID: 77954197439     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3368495     Document Type: Conference Paper

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