Electrochemical deposition and characterization of Ni in mesoporous silicon

Journal of the Electrochemical Society

Volumn 159, Issue 10, 2012, Pages

  Dolgiy, A ^a   Redko, S V ^a   Bandarenka, H ^a   Prischepa, S L ^a   Yanushkevich, K ^b   Nenzi, P ^c   Balucani, M ^c   Bondarenko, V ^a  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

^b INSTITUTE OF SOLID STATE AND SEMICONDUCTOR PHYSICS   (Belarus)

^c SAPIENZA UNIVERSITY OF ROME   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC MAGNETIC MOMENT; ELECTROCHEMICAL DEPOSITION; FERROMAGNETIC PROPERTIES; LOW TEMPERATURES; MESOPOROUS SILICON; NICKEL NANOWIRES; SILICON POTENTIALS; X-RAY DIFFRACTION SPECTRUM;

DEPOSITION; ELECTRODEPOSITION; MAGNETIZATION; MATERIALS HANDLING EQUIPMENT; NANOWIRES; POROUS SILICON; REDUCTION; SILICIDES; SILICON; TEMPERATURE MEASUREMENT; X RAY DIFFRACTION;

NICKEL;

EID: 84873935036     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/2.050210jes     Document Type: Article

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