Single-crystal growth of metallic nanowires with preferred orientation

Nanotechnology

Volumn 16, Issue 9, 2005, Pages 1559-1564

  Pan, Hui ^a   Sun, Han ^a   Poh, Cheekok ^a   Feng, Yuanping ^a   Lin, Jianyi ^a,b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF CHEMICAL AND ENGINEERING SCIENCES   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ALUMINUM OXIDE (AAO); METALLIC NANOWIRES; NANOPORES; SINGLE-CRYSTAL GROWTH;

ALUMINA; CRYSTAL GROWTH; CRYSTAL ORIENTATION; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; ELECTRODEPOSITION; GAS ADSORPTION; HYDROGEN; NICKEL; PH EFFECTS; SILVER; SINGLE CRYSTALS; THERMODYNAMICS; ZINC;

NANOSTRUCTURED MATERIALS;

EID: 23444436141     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/16/9/025     Document Type: Article

References (24)

1. da Silva E Z, Novaes F D, da Silva A J R and Fazzio A 2004 Phys. Rev. B 69 115411
2. Favier F, Walter E C, Zach M P, Benter T and Penner R M 2001 Science 293 2227
3. Ciraci S, Buldum A and Batra I P 2001 J. Phys.: Condens. Matter 13 R537-68
4. Whitney T M, Jiang J S, Searson P C and Chein C L 1993 Science 261 1316-9
5. Chou S Y, Wei M S, Krauss P R and Fischer P B 1994 J. Appl. Phys. 76 6673-5
6. Wu W, Cui B, Sun X, Zhang W, Zhuang L, Kong L and Chou S Y 1998 J. Vac. Sci. Technol. B 16 3825-9
7. McClelland G M, Hart M W, Rettner C T, Best M E, Carter K R and Terris B D 2002 Appl. Phys. Lett. 81 1483-5
8. Garcya J M, Asenjo A, Velazquez J, Garcýa D, Vazquez M, Aranda P and Ruiz-Hitzky E 1999 J. Appl. Phys. 85 5480-2
9. Han G C, Zong B Y and Wu Y H 2002 IEEE Trans. Magn. 38 2562-4
10. Sellmyer D J, Zheng M and Skomski R 2001 J. Phys.: Condens. Matter 13 R433-60
11. Skomski R, Kirby R D and Sellmyer D J 1999 J. Appl. Phys. 85 5069-71
12. Masuda H and Fukuda K 1995 Science 268 1466-8
13. Masuda H and Satoh M 1996 Japan. J. Appl. Phys. 35 L126-9
14. Nielsch K, Wehrspphn R B, Barthel J, Kirschner J, Gosele U, Ficher S F and Kronmuller H 2001 Appl. Phys. Lett. 79 1360-2
15. Sauer G, Brehm G, Schneider S, Nielsch K, Wehrspohn R B, Choi J, Hofmeister H and Gosele U 2002 J. Appl. Phys. 91 3243-7
16. Yin A J, Li J, Jian W, Bennett A J and Xu J M 2001 Appl. Phys. Lett. 79 1039
17. Li Y, Meng G W, Zhang L D and Phillipp F 2000 Appl. Phys. Lett. 76 2011
18. Pan H, Gao H, Lim S, Feng Y and Lin J 2004 J. Nanosci. Nanotechnol. 4 1014
19. Paunovic M and Schleinger M 1998 Fundamentals of Electrochemical Deposition (New York: Wiley) p 125
20. Tian M, Wang J, Kurtz J, Mallouk T E and Chan M H W 2003 Nano Lett. 3 919
21. Amblart J, Froment M, Maurin G, Spyrellis N and Trevisan-Souteyrand E T 1983 Electrochim. Acta 28 909
22. Srolovitz D J, Mazor A and Bukiet G G 1988 J. Vac. Sci. Technol. A 6 2371
23. Budevski E, Staikov G and Lorenz W J 1996 Electrochemical Phase Formation and Growth: An Introduction to the Initial Stage of Metal Deposition (New York: VCH) p 267
24. Switzer J A, Kothari H M and Bohannan E W 2002 J. Phys. Chem. B 106 4027