Porous silicon templates for electrodeposition of nanostructures

Applied Physics A: Materials Science and Processing

Volumn 87, Issue 4, 2007, Pages 773-780

  Aravamudhan, S ^a   Luongo, K ^a   Poddar, P ^b   Srikanth, H ^b   Bhansali, S ^a  

^a University of South Florida   (United States)

^b UNIVERSITY OF SOUTH FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ASPECT RATIO; ELECTRODEPOSITION; MORPHOLOGY; ONE DIMENSIONAL; POROUS SILICON; SCANNING ELECTRON MICROSCOPY; SILICA; X RAY DIFFRACTION;

DISCONTINUOUS GROWTH; ELECTRICAL INTERCONNECTION; METALLIC NANOSTRUCTURES; SILICON BASED SENSORS;

NANOSTRUCTURES;

EID: 34247337569     PISSN: 09478396     EISSN: 14320630     Source Type: Journal    
DOI: 10.1007/s00339-007-3901-4     Document Type: Article

References (51)

1. A. Fert, L. Piraux, J. Magn. Magn. Mater. 200, 338 (1999)
2. F. Patolsky, C.M. Lieber, Mater. Today 20, 20 (2005)
3. D.H. Reich, M. Tanase, A. Hultgren, L.A. Bauer, C.S. Chen, G.J. Meyer, J. Appl. Phys. 93, 7275 (2003)
4. I. Safarik, M. Safarikova, J. Chromatogr. 722, 33 (1999)
5. E.C. Walter, R.M. Penner, H. Liu, K.H. Ng, M.P. Zach, F. Favier, Surf. Interface Anal. 34, 409 (2002)
6. N.I. Kovtyukhova, T.E. Mallouk, Chem. Eur. J. 8, 4355 (2002)
7. E.C. Walter, F. Favier, R.M. Penner, Anal. Chem. 74, 1546 (2002)
8. C.Z. Li, H. Sha, N.J. Tao, Phys. Rev. B 58, 6775 (1998)
9. L.A. Bauer. D.H. Reich, G.J. Meyer, Langmuir 19, 7043 (2003)
10. C.D. Keating, M.J. Natan, Adv. Mater. 15, 451 (2003)
11. C.R. Martin, Science 266, 1961 (1994)
12. J. Hu, T.W. Odom, C.M. Lieber, Ace. Chem. Res. 32, 435 (1999)
13. G.L. Hornyak, C.J. Patrissi, C.R. Martin, J. Phys. Chem. B 101, 1548 (1997)
14. X.Y. Zhang, L.D. Zhang, Y. Lei, L.X. Zhao, Y.Q. Mao, J. Mater. Chem. 11, 1732 (2001)
15. C. Ji, C. Searson, Appl. Phys. Lett. 81, 4437 (2000)
16. C. Schönenberger, B.M.I, van der Zande, L.G.J. Fokkink, J. Phys. Chem. 101, 5497 (1997)
17. T.M. Whitney, J.S. Hang, P.C. Searson, C.L. Chien, Science 261, 1316 (1993)
18. K.B. Lee, S.M. Lee, J. Cheon, Adv. Mater. 13, 517 (2001)
19. H. Föll, M. Christophersen, J. Carstensen, G. Hasse, Mater. Sci. Eng. R 39, 93 (2002)
20. V. Lehmann, U. Gosele, Appl. Phys. Lett. 58, 856 (1991)
21. T.E. Bell, P.T.J. Gennissen, D. DeMunter, M. Kuhl, J. Micromech. Microeng. 6, 361 (1996)
22. L. Seals, J.L. Gole, L.A. Tse, P.J. Hesketh, J. Appl. Phys. 91, 2519 (2002)
23. O. Rabin, P.R. Herz, Y.M. Lin, A.I. Akinwade, S.B. Cronin, M.S. Dresselhaus, Adv. Funct. Mater. 13, 631 (2003)
24. J.J. Boote, S.D. Evans, Nanotechnology 16, 1500 (2005)
25. Y. Huang, X. Duan, Q. Wei, C.M. Lieber, Science 291, 630 (2001)
26. J. Xu, A.J. Steckl, Appl. Phys. Lett. 65, 2081 (1994)
27. S. Aravamudhan, S. Kedia, S. Bhansali, in 207th Meet. Electrochemical Society, 2005
28. M. Jeske, J.W. Schultze, M. Thonissen, H. Munder, Thin Solid Films 255,63(1995)
29. S. Gusev, N. Korotkova, D. Rozenstein, A. Freerman, J. Appl. Phys. 76, 6671(1994)
30. K. Rumpf, P. Grantizer, H. Krenn, Mater. Res. Soc. Symp. Proc. 877,7.2 (2005)
31. P. Grantizer, K. Rumpf, S. Sumev, H. Krenn, J. Magn. Magn. Mater. 290, 735 (2005)
32. S.A. Nikitchuk, M.V. Lokhanin, A.V. Prokanikov, N.A. Rud, V.B. Svetovol, Technol. Phys. Lett. 31, 513 (2005)
33. M.J.J. Theunissen, J. Electrochem. Soc. 119, 351 (1972)
34. V. Lehmann, H. Foil, J. Electrochem. Soc. 197, 653 (1990)
35. T. Osaka, K. Ogasawara, S. Nakahara, J. Electrochem. Soc. 144, 3226 (1997)
36. M. Christophersen, J. Carstensen, S. Rönnebeck, C. Jáger, W. Jáger, H. Föll, J. Electrochem. Soc. 148, 267 (2001)
37. D.H. Reich, M. Tanase, A. Hultgren, L.A. Bauer, C.S. Chen, G.J. Meyer, J. Appl. Phys. 93, 7554 (2003)
38. J.W. Choi, C.H. Ahn, S. Bhansali, H.T. Henderson, Sens. Actuators B 68, 34 (2000)
39. N.A. Frey, R. Hajndl, S. Srinath, H. Srikanth, unpublished
40. N.A. Frey, Master's thesis, University of South Florida (2004)
41. H.R. Khan, K. Petrikowski, J. Magn. Magn. Mater. 215-216, 526 (2000)
42. L. Sun, Y. Hao, C.L. Chien, P.C. Searson, IBM J. Res. Dev. 49, 79 (2005)
43. Q. Zhan, Z. Chen, D. Xue, F. Li, H. Kunkel, X. Zhou, R. Roshko, G. Williams, Phys. Rev. B 66, 134436 (2002)
44. R. Metzger, V.V. Konovalov, M. Sun, G. Zangari, B. Xu, M. Benakli, W.D. Doyle, IEEE Trans. Magn. 36, 30 (2000)
45. J. Mallet, K. Yu-Zhang, C.L. Chien, T.S. Eagleton, P.C. Searson, Appl. Phys. Lett. 84, 3900 (2004)
46. S. Ge, C. Li, X. Ma, W. Li, L. Xi, C.X. Li, J. Appl. Phys. 90, 509 (2001)
47. D.J. Sellmyer, M. Zheng, R. Shomski, J. Phys.: Condens. Matter 13, 433 (2001)
48. A. Kumar, S. Fähler, H. Schlörb, K. Leisiner, L. Schultz, Phys. Rev. B 73, 064421 (2006)
49. M. Vázquez, K. Pirota, J. Torrejón, D. Navas, M. Hernández-Vëlez, J. Magn. Magn. Mater. 294, 174 (2005)
50. S. Chikazumi, Physics of Magnetism (Wiley, New York, 1964)
51. X.P. Li, Z.J. Zhao, H.L. Seet, W.M. Heng, T.B. Oh, J.Y. Lee, J. Appl. Phys. 94, 6655 (2003)