Formation of Ni2Si suicide in Ni/Si bilayers by ion beam mixing

Vacuum

Volumn 77, Issue 2, 2005, Pages 125-130

  Boussaa, N ^a   Guittoum, A ^a   Tobbeche, S ^a  

^a CENTRE DE RECHERCHE NUCLÉAIRE D ALGER   (Algeria)

Author keywords

Ion beam mixing; RBS; Silicide; Structure and morphology

Indexed keywords

ARGON; MORPHOLOGY; NICKEL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

ION BEAM MIXING; RBS; SILICIDE; STRUCTURE AND MORPHOLOGY;

ION BEAMS;

EID: 10844239837     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.07.081     Document Type: Article

References (27)

1. Nastasi M, Mayer JW. Mat Sci Eng 1994;R12:1.
2. Bolse W. Mat Sci Eng A 1998;253:194.
3. Lau BX. Phys Stat Sol (a) 1996;94:11.
4. Cheng YT. Mat Sci Rep 1990;5:45.
5. Shi F, Boise W, Lieb KP. J Appl Phys 1995;78(4):2303.
6. McHargue CJ, Joslin DL, White CW. Nucl Instr Meth B 1994;91:549.
7. Sinha SK, Kothari DC, Som T, Kolkari VN, Nair KGM, Natali M. Nucl Instr Meth B 2000;170:120.
8. Kraft S, Schattat B, Bolse W, Klaumunzer S, Harbsmeier F, Kulinska A, Loffi A. J Appl Phys 2002;91(3):1129.
9. Boise W. Mat Sci Eng 1994;R12:53.
10. Gaiduk PI, Komarov FF, Witzman A, Zentdraf A, Shipel S. Nucl Instr Meth B 1994;94:231.
11. Bibic N, Dhar S, Milosavljevic M, Removic K, Rissanen L, Lieb KP. Nucl Instr Meth B 2000;161/163:1011.
12. Sarkar DK, Dhara S, Gupta A, Nair KGM, Chaudhury S. Nucl Instr Meth B 2000;168:21.
13. Milosavljevic M, Dhar S, Schaaf P, Bibic N, Huang YL, Seibt M, Lieb KP. J Appl Phys 2001;90(9):4474.
14. d'Heurle FM, Was P. J Matter Res 1986;1:205.
15. Baba A, Aramaki H, Sadoh T, Tsurushima T. J Appl Phys 1997;82:5480.
16. McHargue CJ, Parlow GC, White CW, Williams JM, Appleton BR, Naramoto H. Mat Sci Eng 1985;69:123.
17. Johnson WL, Cheng YT, Van Rossum M, Nicolet MA. Nucl Instr Meth B 1985;7/8:657.
18. Averback RS, Thompson LJ, Moyle Jr J, Schalit M. J Appl Phys 1982;53(3):1342.
19. Desimioni J, Traverse A. Phys Rev B 1993;48:13266.
20. Hung LS, Mayer JW. Thin Solid Films 1983;109(1):85.
21. d'Heurle F, Petersson CS, Baglin JEE, La Placa SJ, Wong CY. J Appl Phys 1984;55(12):4208.
22. Ziegler JF, Biersack JP, Littmark U. The stopping range of ions in solids. New York: Pergamon; 1985.
23. Doolittle LR. Nucl Instr Meth B 1985;9:344.
24. JCPDS card number 87-0712.
25. JCPDS card number 73-2092.
26. Dan PA, Popovici G, Dascalu D, Brezeanu G, Popa A. J Electrochem Soc 1983;130(12):2472.
27. Sinha AK. J Electrochem Soc 1973; 1767.