Low-temperature cyclonic plasma created at atmospheric pressure

IEEE Transactions on Plasma Science

Volumn 37, Issue 7 SPEC. ISS. PART 1, 2009, Pages 1169-1171

  Huang, Chun ^a   Liu, Chi Hung ^b   Wu, Shin Yi ^a   Chen, Tai Hung ^c   Teng, Jyh Tong ^c   Su, Chun Hsien ^b   Chen, Chih Ming ^b  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c CHUNG YUAN CHRISTIAN UNIVERSITY   (Taiwan)

Author keywords

Atmospheric pressure plasma; Plasma applications; Plasma devices; Surface modification

Indexed keywords

ATMOSPHERIC PLASMAS; ATMOSPHERIC PRESSURE PLASMA; ATMOSPHERIC PRESSURE PLASMAS; GAS FLOW PATTERNS; GAS PHASE TEMPERATURE; GAS VELOCITY; HEAT-SENSITIVE MATERIALS; HIGH-SPEED; LOW TEMPERATURES; NONTHERMAL ATMOSPHERIC PLASMAS; NOVEL TECHNIQUES; OPERATIONAL PARAMETERS; PLASMA TEMPERATURE; RF PLASMA SOURCE; SURFACE MODIFICATION;

ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; ATMOSPHERICS; FLOW PATTERNS; GAS DYNAMICS; PLASMA APPLICATIONS; PLASMA DEVICES; PLASMA SOURCES; SURFACE TREATMENT;

ATMOSPHERIC TEMPERATURE;

EID: 67949118771     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2015323     Document Type: Article

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