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Volumn 41, Issue 1, 2009, Pages 44-48
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Surface characterization of the SiOx films prepared by a remote atmospheric pressure plasma jet
a
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Author keywords
Atmospheric pressure plasma; Silicon oxide; Surface characteristics; Thin film
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Indexed keywords
ATMOSPHERIC CHEMISTRY;
ATMOSPHERIC PRESSURE;
ATMOSPHERICS;
CARBON FILMS;
DEPOSITION;
ELECTRODEPOSITION;
FILM PREPARATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
HARDNESS;
HARDNESS TESTING;
INFRARED SPECTROSCOPY;
JETS;
OXIDES;
OXYGEN;
PLASMA SOURCES;
PLASMAS;
PRESSURE;
PUMPING PLANTS;
SEMICONDUCTING SILICON COMPOUNDS;
SILICA;
SILICON COMPOUNDS;
SUBSTRATES;
SURFACE MORPHOLOGY;
THIN FILM DEVICES;
THIN FILMS;
ANALYSIS RESULTS;
ATMOSPHERIC PRESSURE PLASMA;
CHEMICAL CHARACTERISTICS;
CHEMICAL VAPOR DEPOSITION PROCESSES;
ELEMENTAL COMPOSITIONS;
FOURIER TRANSFORM INFRARED (FT-IR);
KEY FACTORS;
PENCIL HARDNESS;
SILICON OXIDE;
SMOOTH SURFACES;
SUBSTRATE TEMPERATURE (ST);
SURFACE CHARACTERISTICS;
SURFACE CHARACTERIZATION;
TETRA ETHOXY SILANE (TEOS);
THIN FILM;
SURFACE PROPERTIES;
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EID: 58449132907
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.2975 Document Type: Article |
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Times cited : (17)
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References (15)
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