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Volumn 93, Issue , 2013, Pages 84-89

Monitoring of sterilization in an oxygen plasma apparatus, employing a quartz crystal microbalance (QCM) method

(6) Yoshino, Kiyoshi a Matsumoto, Hiroyuki a Iwasaki, Tatsuyuki a Kinoshita, Shinobu a Noda, Kazutoshi b Iwamori, Satoru c

a Iwasaki Electric Co Ltd (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

c TOKAI UNIVERSITY (Japan)

Author keywords

Atomic oxygen; Fluorocarbon thin film; Inactivation; Oxygen plasma apparatus; Quartz crystal microbalance; Sterilization

Indexed keywords

ASPERGILLUS NIGER; ATOMIC OXYGEN; ATOMIC OXYGEN EXPOSURE; BACILLUS SUBTILIS; COLD OXYGEN PLASMA; FLUOROCARBON THIN FILMS; INACTIVATION; INACTIVATION MECHANISMS; INACTIVATION OF MICROORGANISMS; OXYGEN PLASMAS; POSITIVE CORRELATIONS;

ASPERGILLUS; ATOMS; MICROORGANISMS; PLASMAS; QUARTZ CRYSTAL MICROBALANCES; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; STERILIZATION (CLEANING);

OXYGEN;

EID: 84873617680 PISSN: 0042207X EISSN: None Source Type: Journal
DOI: 10.1016/j.vacuum.2013.01.009 Document Type: Article

Times cited : (26)

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