Plasma-based ion implantation sterilization technique and ion energy estimation

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 1018-1021

  Tanaka, T ^a   Watanabe, S ^b   Shibahara, K ^c   Yokoyama, S ^c   Takagi, T ^a  

^a HIROSHIMA INSTITUTE OF TECHNOLOGY   (Japan)

^b Soken Industries Co Ltd   (Japan)

^c HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CELLS; ELECTRIC POTENTIAL; ELECTRODES; ION IMPLANTATION; NITROGEN; SILICON;

ION ENERGY ESTIMATION; PLASMA-BASED ION IMPLANTATION (PBII);

STERILIZATION (CLEANING);

EID: 31044433956     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1943468     Document Type: Conference Paper

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