Highly efficient photoinduced desorption of N2O and CO from porous silicon

Journal of Chemical Physics

Volumn 138, Issue 4, 2013, Pages

  Toker, Gil ^a   Sagi, Roey ^a   Bar Nachum, Shay ^a   Asscher, Micha ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CO COVERAGE; CO MOLECULE; COMPETING PROCESS; FLUENCE DEPENDENCE; HOT ELECTRON TRANSFER; LARGE CROSS-SECTIONS; LASER INDUCED THERMAL DESORPTION; LOCALIZED HOLES; ORDERS OF MAGNITUDE; PHOTO-DESORPTION; PHOTO-INDUCED DESORPTION; SURFACE OXIDATIONS; UV IRRADIATION;

ADSORBATES; MOLECULES; THERMAL DESORPTION;

POROUS SILICON;

CARBON MONOXIDE; NITROUS OXIDE; SILICON;

ARTICLE; CHEMISTRY; PHOTOCHEMISTRY; POROSITY; SURFACE PROPERTY;

CARBON MONOXIDE; NITROUS OXIDE; PHOTOCHEMICAL PROCESSES; POROSITY; SILICON; SURFACE PROPERTIES;

MLCS; MLOWN;

EID: 84873607813     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4788959     Document Type: Article

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