Electrochemical formation of porous silicon with medium-sized pores

Electrochemistry

Volumn 75, Issue 3, 2007, Pages 270-272

  Ogatv, Yukio H ^a   Koyama, Akihiro ^a   Harraz, Farid A ^b   Salem, Mohamed S ^a   Sakka, Tetsuo ^a  

^a KYOTO UNIVERSITY   (Japan)

^b CENTRAL METALLURGICAL RESEARCH AND DEVELOPMENT INSTITUTE CMRDI   (Egypt)

Author keywords

HF etching; Medium pores; Oxidizing agent; Porous silicon

Indexed keywords

ANODIC OXIDATION; ELECTROCHEMISTRY; POTASSIUM COMPOUNDS; SOLUTIONS; SURFACE ACTIVE AGENTS;

ELECTROCHEMICAL FORMATION; MEDIUM-SIZED PORES; PORE WIDENING;

POROUS SILICON;

EID: 34247335495     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.75.270     Document Type: Article

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