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Volumn 156, Issue , 2013, Pages 38-40
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Resistive switching behaviors in electrodeposited BaTiOF4 nanorod layers
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Author keywords
A. BaTiOF4; B. Electrodeposition; D. Resistive switching
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Indexed keywords
A. BATIOF4;
CONDUCTING FILAMENT;
ELECTROCHEMICAL DEPOSITION PROCESS;
NANOROD LAYERS;
NON-VOLATILE MEMORY APPLICATION;
RESISTIVE SWITCHING;
RESISTIVE SWITCHING BEHAVIORS;
VERTICALLY ALIGNED;
WELL-ALIGNED;
ELECTRODEPOSITION;
REDUCTION;
SWITCHING SYSTEMS;
NANORODS;
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EID: 84873582358
PISSN: 00381098
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ssc.2012.12.007 Document Type: Article |
Times cited : (4)
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References (12)
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