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Volumn 156, Issue , 2013, Pages 38-40

Resistive switching behaviors in electrodeposited BaTiOF4 nanorod layers

Author keywords

A. BaTiOF4; B. Electrodeposition; D. Resistive switching

Indexed keywords

A. BATIOF4; CONDUCTING FILAMENT; ELECTROCHEMICAL DEPOSITION PROCESS; NANOROD LAYERS; NON-VOLATILE MEMORY APPLICATION; RESISTIVE SWITCHING; RESISTIVE SWITCHING BEHAVIORS; VERTICALLY ALIGNED; WELL-ALIGNED;

EID: 84873582358     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2012.12.007     Document Type: Article
Times cited : (4)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.