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Surface and Interface Analysis

Volumn 45, Issue 1, 2013, Pages 167-170

Ion-induced damage evaluation with Ar cluster ion beams

(5) Yamamoto, Yasuyuki a Ichiki, Kazuya a Seki, Toshio a,c Aoki, Takaaki a,c Matsuo, Jiro b,c

a KYOTO UNIVERSITY (Japan)

b Quantum Science and Education Center (Japan)

c JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

Ar cluster; molecular depth profiling; PCBM; polystyrene; ToF SIMS

Indexed keywords

CLUSTER ION BEAMS; CONVENTIONAL SPUTTERING; DAMAGE DEPTHS; DAMAGED LAYERS; GAS CLUSTERS; ION-INDUCED DAMAGE; METHYL ESTERS; MOLECULAR DEPTH PROFILING; MOLECULAR IONS; ORGANIC MATERIALS; PCBM; PEAK INTENSITY; TOF SIMS;

ION SOURCES; IONS; POLYSTYRENES; SECONDARY ION MASS SPECTROMETRY;

ARGON;

EID: 84872847035 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.5014 Document Type: Conference Paper

Times cited : (10)

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