Depth profiling of polymer samples using Ga+ and C 60+ ion beams

Surface and Interface Analysis

Volumn 41, Issue 1, 2009, Pages 6-10

  Nieuwjaer, N ^a,b   Poleunis, C ^b   Delcorte, A ^b   Bertrand, P ^b  

^a UNIVERSITÉ PARIS 13   (France)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

Author keywords

C60+; Depth profiling; PMMA; Polyatomic projectiles; PS; ToF SIMS

Indexed keywords

BALLISTICS; IONS; PHOTORESISTS; POLYMERS; POLYSTYRENES; PROJECTILES; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

C60+; PMMA; POLYATOMIC PROJECTILES; PS; TOF-SIMS;

DEPTH PROFILING;

EID: 58449084448     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2931     Document Type: Conference Paper

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