Surface smoothing with large current cluster ion beam

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 216, Issue 1-4, 2004, Pages 191-195

  Seki, T ^a,b,c   Matsuo, J ^a  

^a KYOTO UNIVERSITY   (Japan)

^b Collab Res Ctr N SMAQBT ^*  (Japan)

^c Collab Res Ctr Cluster Ion BPT ^*  (Japan)

Author keywords

Cluster; Diamond; Ion beam; Nozzle; Smoothing; Time of flight (TOF)

Indexed keywords

DIAMONDS; DOSIMETRY; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ETCHING; ION BOMBARDMENT; ION IMPLANTATION; SPUTTER DEPOSITION; SURFACE ROUGHNESS; VACUUM APPLICATIONS;

CLUSTER; SMOOTHING; TIME-OF-FLIGHT (TOF);

ION BEAMS;

EID: 1042288919     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2003.11.078     Document Type: Conference Paper

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