Using ellipsometry for the evaluation of surface damage and sputtering yield in organic films with irradiation of argon cluster ion beams

Surface and Interface Analysis

Volumn 43, Issue 1-2, 2011, Pages 84-87

  Hada, Masaki ^a   Ninomiya, Satoshi ^a   Seki, Toshio ^a   Aoki, Takaaki ^a   Matsuo, Jiro ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

cluster ion; damage evaluation; L leucine; optical method

Indexed keywords

ACCURATE MEASUREMENT; ARGON CLUSTERS; CLUSTER ION BEAMS; CLUSTER IONS; DAMAGE EVALUATION; DAMAGED LAYERS; L-LEUCINE; MONOMER ION BEAMS; OPTICAL METHODS; ORGANIC FILMS; SPUTTERING YIELDS; SURFACE DAMAGES;

AMINO ACIDS; ARGON; BEAM PLASMA INTERACTIONS; ELLIPSOMETRY; ION BEAMS; ION BOMBARDMENT; SPUTTERING;

IONS;

EID: 78951478536     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3452     Document Type: Conference Paper

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