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Nanoscale

Volumn 5, Issue 3, 2013, Pages 1097-1104

FluidFM as a lithography tool in liquid: Spatially controlled deposition of fluorescent nanoparticles

(3) Grüter, Raphael R a Vörös, János a Zambelli, Tomaso a

a ETH ZURICH (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION PROCESS; AFM; APPLIED PRESSURE; ATOMIC FORCE MICROSCOPE (AFM); CAPILLARY ACTION; CHARGED NANOPARTICLES; CONTACT TIME; CONTROLLED DEPOSITION; DEPOSITION PROCESS; ELECTROCHEMICAL DEPOSITION; EX SITU; FLUORESCENT NANOPARTICLES; GLASS SURFACES; HIGH RESOLUTION; HYDRODYNAMIC RESISTANCE; IN-SITU MONITORING; LANGMUIRS; LIQUID ENVIRONMENT; LITHOGRAPHY TOOLS; LOCAL DEPOSITION; NANO-OBJECTS; NANOMETRES; NANOPARTICLE DOTS; OVERPRESSURE; POLYCATIONS; RANDOM SEQUENTIAL ADSORPTION MODELS; TIP VELOCITY; VOLUMETRIC FLOW;

ADSORPTION; ATOMIC FORCE MICROSCOPY; FLUORESCENCE; NANOPARTICLES; OPTICAL MICROSCOPY; POLYSTYRENES; REDUCTION; SCANNING ELECTRON MICROSCOPY;

LIQUIDS;

FLUORESCENT DYE; NANOMATERIAL;

ADSORPTION; ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; CRYSTALLIZATION; MATERIALS TESTING; METHODOLOGY; MICROFLUIDICS; MOLECULAR IMPRINTING; PARTICLE SIZE; SURFACE PROPERTY; ULTRASTRUCTURE;

ADSORPTION; CRYSTALLIZATION; FLUORESCENT DYES; MATERIALS TESTING; MICROFLUIDICS; MICROSCOPY, ATOMIC FORCE; MOLECULAR IMPRINTING; NANOSTRUCTURES; PARTICLE SIZE; SURFACE PROPERTIES;

MLCS; MLOWN;

EID: 84872721855 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c2nr33214k Document Type: Article

Times cited : (38)

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