Micro/nanowires fabrication: Design consideration for reliable and repeatability in pattern transfer

Proceedings of International Conference on Computational Intelligence, Modelling and Simulation

Volumn , Issue , 2012, Pages 48-53

  Adam, Tijjani ^a   Hashim, Uda ^a  

^a UNIVERSITY MALAYSIA PERLIS   (Malaysia)

Author keywords

Pattern transfer; Nanowire; repeatability and reliability; fabrication; precision; alignment; critical dimension

Indexed keywords

ALIGNMENT ERROR; ALIGNMENT MARKS; CIRCUIT FAILURES; CRITICAL DIMENSION; CRITICAL STEPS; DESIGN CONSIDERATIONS; PATTERN TRANSFERS; PHOTOLITHOGRAPHY PROCESS; RESOLUTION REQUIREMENTS; WAFER SURFACE;

ARTIFICIAL INTELLIGENCE; FABRICATION; NANOWIRES; PHOTORESISTS;

ALIGNMENT;

EID: 84872578844     PISSN: 21668523     EISSN: 21668531     Source Type: Conference Proceeding    
DOI: 10.1109/CIMSim.2012.79     Document Type: Conference Paper

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