Electrical and optical studies of Ga-doped ZnO thin films

Journal of Materials Science: Materials in Electronics

Volumn 24, Issue 1, 2013, Pages 13-19

  Hsu, Hsiu Ling ^a   Yang, Ching Been ^b   Huang, Chia Ho ^a   Hsu, Chun Yao ^a  

^a LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NANYA INSTITUTE OF TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC TARGET; CRYSTALLINE QUALITY; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; GA-DOPED; GA-DOPED ZNO; GLASS SUBSTRATES; GREY RELATIONAL ANALYSIS; GREY RELATIONAL GRADE; GREY-BASED TAGUCHI METHOD; OPTICAL STUDY; OPTIMAL LEVEL; PERFORMANCE CHARACTERISTICS; PREFERRED ORIENTATIONS; PROCESS PRESSURE; RADIO FREQUENCY MAGNETRON SPUTTERING; RESPONSE GRAPHS; STRUCTURAL FEATURE;

DEPOSITION; ELECTRIC CONDUCTIVITY; GALLIUM; INFORMATION THEORY; OPTICAL PROPERTIES; OPTIMIZATION; SUBSTRATES; TAGUCHI METHODS; THIN FILMS; ZINC OXIDE;

VAPOR DEPOSITION;

EID: 84871946238     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-012-0735-4     Document Type: Article

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