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Volumn 31, Issue 1, 2013, Pages

Atomic layer deposition of Al-doped ZnO thin films

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; AL-DOPING; ALUMINUM-DOPED ZNO; BOROSILICATE GLASS SUBSTRATES; CARRIER DOPING; DOPANT CONTENT; GROWTH CHARACTERISTIC; OPTICAL REFLECTIVITY; SEEBECK COEFFICIENT MEASUREMENT; X RAY REFLECTION; X-RAY FLUORESCENCE MEASUREMENT; ZNO;

EID: 84871887190     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4757764     Document Type: Article
Times cited : (33)

References (19)
  • 12
    • 0033886407 scopus 로고    scopus 로고
    • Study of atomic layer epitaxy of zinc oxide by in-situ quartz crystal microgravimetry
    • DOI 10.1016/S0169-4332(99)00330-X
    • E. B. Yousfi, J. Fouache, and D. Lincot, Appl. Surf. Sci. 153, 223 (2000). 10.1016/S0169-4332(99)00330-X (Pubitemid 30542005)
    • (2000) Applied Surface Science , vol.153 , Issue.4 , pp. 223-234
    • Yousfi, E.B.1    Fouache, J.2    Lincot, D.3
  • 15
  • 16
    • 80054800110 scopus 로고    scopus 로고
    • 10.1016/j.ca2011.06.017
    • B.-Y. Oh, Curr. Appl. Phys. 12, 273 (2012). 10.1016/j.cap.2011.06.017
    • (2012) Curr. Appl. Phys. , vol.12 , pp. 273
    • Oh, B.-Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.