Use of nanoimprinted surface patterns to mitigate colloidal deposition on ultrafiltration membranes

Journal of Membrane Science

Volumn 428, Issue , 2013, Pages 598-607

  Maruf, Sajjad H ^a   Wang, Liang ^a   Greenberg, Alan R ^a   Pellegrino, John ^a   Ding, Yifu ^a  

^a University of Colorado at Boulder   (United States)

Author keywords

Colloidal fouling; Nanoimprint lithography; Surface modification; Surface pattern; Ultrafiltration

Indexed keywords

COLLOIDAL DEPOSITION; COLLOIDAL FOULING; COLLOIDAL SILICA PARTICLES; CRITICAL FLUX; DEGREE OF ANISOTROPY; FLOW DIRECTION; FLUX DECLINE; LIQUID SEPARATION; MEMBRANE SURFACE MODIFICATIONS; ORIENTATION ANGLES; PARTICLE DEPOSITIONS; PERMEABILITY PROPERTIES; PRESSURE-DRIVEN; SUBMICRON PATTERNS; SUBMICRON SCALE; SURFACE PATTERN; TOPOGRAPHIC ROUGHNESS; ULTRA-FILTRATION MEMBRANES;

ANISOTROPY; MEMBRANE FOULING; NANOIMPRINT LITHOGRAPHY; SILICA; SURFACE CHEMISTRY; SURFACE TREATMENT; TEXTILE PRINTING; ULTRAFILTRATION;

SUSPENSIONS (FLUIDS);

NANOPARTICLE; POLYSULFONE; SILICON DIOXIDE;

ANISOTROPY; ARTICLE; BIOFOULING; COLLOID; CONTROLLED STUDY; FLOW RATE; LEARNING; MAGNITUDE ESTIMATION METHOD; MEMBRANE PERMEABILITY; MOLECULAR IMPRINTING; NANOFILTRATION; NANOIMPRINT LITHOGRAPHY; PARTICLE SIZE; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; ULTRAFILTRATION;

EID: 84871463611     PISSN: 03767388     EISSN: 18733123     Source Type: Journal    
DOI: 10.1016/j.memsci.2012.10.059     Document Type: Article

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