Highly conductive and damp heat stable transparent ZnO based thin films for flexible electronics

Journal of Alloys and Compounds

Volumn 554, Issue , 2013, Pages 240-245

  Jung, Keun ^a   Choi, Won Kook ^a   Chae, Keun Hwa ^a   Song, Jong Han ^a   Yoon, Seok Jin ^a   Lee, Myung Hyun ^b   Choi, Ji Won ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Korea Institute of Ceramic Engineering and Technology (KICET)   (South Korea)

Author keywords

Electrode materials; Electronic properties; EXAFS; Optical properties; Oxide materials; Thin films

Indexed keywords

AL-DOPED ZNO; AZO THIN FILMS; CONTINUOUS COMPOSITION SPREADS; DAMP HEAT; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRODE MATERIAL; EXAFS; OXIDE MATERIALS; RF-SPUTTERING; ROOM TEMPERATURE; VISIBLE REGION; ZNO;

DEPOSITS; ELECTRIC PROPERTIES; ELECTRONIC PROPERTIES; OPTICAL PROPERTIES; ZINC OXIDE;

THIN FILMS;

EID: 84871447271     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2012.11.021     Document Type: Article

References (23)

1. Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa Appl. Phys. Lett. 86 2005 2521011 2521013
2. S. Major, S. Kumar, M. Bhatnagar, and K.L. Chopra Appl. Phys. Lett. 49 1986 394 396
3. H.L. Hartnagel, A.L. Dawar, A.K. Jain, and C. Jagadish Semiconducting Transparent Thin Films 1995 Taylor & Francis Bristol, U.K.
4. T. Minami MRS Bull. 25 2000 38 44
5. T. Minami, T. Miyata, Y. Ohtani, and Y. Mochizuki Jpn. J. Appl. Phys. 45 2006 L409 L412
6. T. Minami, S. Tsukada, Y. Minamino, and T. Miyata J. Vac. Sci. Technol. A 23 2005 1128 1132
7. H. Kim, C.M. Gilmore, J.S. Horwitz, A. Pique, H. Murata, G.P. Kushto, R. Schlaf, Z.H. Kafafi, and D.B. Chrisey Appl. Phys. Lett. 76 2000 259 261
8. T. Minami, H. Nanto, S. Shooji, and S. Takata Thin Solid Films 135 1986 183 187
9. R.B. van Dover, L.F. Schneemeyer, and R.M. Fleming Nature 392 1998 162 164
10. I. Ohkubo, H.M. Christen, P. Khalifah, S. Sathyamurthy, H.Y. Zhai, C.M. Rouleau, D.G. Mandrus, and D.H. Lowndes Appl. Surf. Sci. 223 2004 35 38
11. A. Venimadhav, K.A. Yates, and M.G. Blamire J. Comb. Chem. 7 2005 85 89
12. S. Yaginuma, K. Itaka, Y. Matsumoto, T. Ohnishi, M. Lippmaa, T. Nagata, T. Chikyowe, and H. Koinuma Appl. Surf. Sci. 254 2008 2336 2341
13. S.-H. Park, K.-B. Kim, S.-Y. Seo, S.-H. Kim, S.-W. Han, and J. Electro Mater 8 2006 1680 1684
14. B. Raval, M. Newville, and J. Synchr Radiation 12 2005 537 541
15. J.J. Lu, S.Y. Tsai, Y.M. Lu, T.C. Lin, and K.J. Gan Solid State Commun. 149 2009 2177 2180
16. H.T. Cao, Z.L. Pei, J. Gong, C. Sun, R.F. Juang, and L.S. Wen Surf. Coat. Technol. 184 2004 84 92
17. E. Burstein Phys. Rev. 93 1954 632 633
18. T.S. Moss Proc. Phys. Soc. London B 67 1954 775 782
19. F. Ruske, M. Roczen, K. Lee, M. Wimmer, S. Gall, J. Hüpkes, D. Hrunski, and B. Rech J. Appl. Phys. 107 2010 0137081 0137088
20. S. Jäger, G. Bräuer, J. Szczyrbowski, and B. Szyszka Surf. Coat. Technol. 98 1998 1304 1314
21. H. Takeda, Y. Sato, Y. Iwabuchi, M. Yoshikawa, and Y. Shigesato Thin Solid Films 517 2009 3048 3052
22. S.-Y. Kuo, K.-C. Liu, F.-I. Lai, J.-F. Yang, W.-C. Chen, M.-Y. Hsieh, H.-I. Lin, and W.-T. Lin Microelectron. Reliab. 50 2010 730 733
23. Y. Igasaki, and H. Kanma Appl. Surf. Sci. 169 2001 508 511