Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering

Surface and Coatings Technology

Volumn 184, Issue 1, 2004, Pages 84-92

  Cao, H T ^a   Pei, Z L ^a   Gong, J ^a,b   Sun, C ^a,b   Huang, R F ^a   Wen, L S ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b Shenyang Research Center for Interfacial Materials   (China)

Author keywords

DC reactive magnetron sputtering; Electro optical properties; Structural properties; Transparent conductive oxide

Indexed keywords

ALUMINUM; COMPRESSIVE STRESS; DOPING (ADDITIVES); MAGNETRON SPUTTERING; MANGANESE; THIN FILMS; X RAY DIFFRACTION;

COMPOSITIONAL ANALYSIS; HALL EFFECT MEASUREMENT;

COATING TECHNIQUES;

COATING;

EID: 2642552223     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.09.046     Document Type: Article

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