Cost-effective printed memristor fabrication and analysis

International Workshop on Cellular Nanoscale Networks and their Applications

Volumn , Issue , 2012, Pages

  Choi, Kyung Hyun ^a   Awais, Muhammad Naeem ^a   Kim, Hyung Chan ^a   Doh, Yang Hui ^a  

^a Jeju National University   (South Korea)

Author keywords

Electrohydrodynamic Printing; Memristor; Printed Electronics; Resistive Switching; Roll to Plate Printing

Indexed keywords

CURRENT VOLTAGE; DEVICE FABRICATIONS; GRAPHENE OXIDES; MEMRISTIVE BEHAVIOR; MEMRISTOR; METAL-INSULATOR-METAL STRUCTURES; MIM STRUCTURE; PRINTED ELECTRONICS; PRINTING TECHNIQUES; RESISTIVE SWITCHING; RESISTIVE SWITCHING BEHAVIORS;

COST EFFECTIVENESS; ELECTROHYDRODYNAMICS; MEMRISTORS; MIM DEVICES; NANOTECHNOLOGY; PASSIVE FILTERS; POLYIMIDES; PRINTING; RESISTORS; SWITCHING SYSTEMS; TITANIUM; TITANIUM OXIDES; ZIRCONIA;

COST BENEFIT ANALYSIS;

EID: 84870736066     PISSN: 21650160     EISSN: 21650179     Source Type: Conference Proceeding    
DOI: 10.1109/CNNA.2012.6331465     Document Type: Conference Paper

References (23)

1. L. O. Chua, "Memristor - the missing circuit element," IEEE Trans. Circuit Theory, vol. 18, no. 5, pp. 507-519, Sep. 1971.
2. L. O. Chua, and S. M. Kang, "Memristive Devices and Systems," IEEE Trans. Circuit Theory, vol. 64, no. 2, pp. 209-223, Feb. 1976.
3. D. B. Strukov, G. S. Sniker, D. R. Stewart, and R. S. Williams, "The missing memristor found," Nature, vol. 453, no. 179, pp. 80-83, May 2008.
4. T. W. Hickmott, "Low-frequency negative resistance in thin anodic oxide films," J. of Appl. Phys., vol. 33, no. 9, pp. 2669-2682, Sep. 1962.
5. A. Asamitsu, Y. Tomioka, H. Kuwahara, Y. Tokura, "Current switching of resistive states in magnetoresistive manganites," Nature, vol. 388, pp. 50-52, Jul. 1997.
6. A. Beck, J. G. Bednorz, C. Gerber, C. Rossel, "Reproducible switching effect in thin oxide films for memory applications," Appl. Phys. Lett., vol. 77, no. 1, pp. 139-141, Jul. 2000.
7. 2,"IEEE Trans. Electron Devices, vol. 54, no. 10, pp. 2762-2768, Oct. 2007.
8. G. Y. Jung, S. Ganapathiappan, D. A. A. Ohlberg, D. L. Olynick, Y. Chen, W. M. Tong and R. S. Williams, "Fabrication of a 34x34 Crossbar Structure at 50 nm Half-pitch by UV-based Nanoimprint Lithography," Nano Lett., vol. 4, no. 7, pp. 1225-1229, Jun. 2004.
9. T. Prodromakis, K. Michelakis and C. Toumazou, "Practical micro/nano fabrication implementations of memristive devices," Cellular Nanoscale Networks and Their Applications (CNNA), 2010 12th International Workshop on, Berkeley, DOI: 10.1109/CNNA.2010.5430323, (2010).
10. B. Li, X. Tang, H. Xie and X. Zhang, "Focused ion beam (FIB) nanomachining and FIB Moire technique for strain analysis in MEMS/NEMS structures and devices," Micro Electro Mechanical Systems, 2003. MEMS-03 Kyoto IEEE The Sixteenth Annual International Conference on, DOI: 10.1109/MEMSYS.2003.1189839, 674 (2003).
11. B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S. Hwang, K. Szot, R.Waser, B. Reichenberg, and S. Tiedke, "Resistive switching mechanism of TiO2 thin films grown by atomiclayer deposition," J. Appl. Phys., vol. 98, no. 3, pp. 33 715-1-33 715-10, 2005.
12. J. J. Yang, F. Miao, M. D. Pickett, D. A. A. Ohlberg, D. R. Stewart, C. N. Lau & R. S. Williams, "The mechanism of electroforming of metal oxide memristive switches," Nanotechnology, vol. 20, no. 21, pp. 215201(9), May. 2009.
13. N. G. Hackett, B. Hamadani, B. dunlap, J. Suehle, C. Richter, C. Hacker & D. Gundlach, "A Flexible Solution-Processed Memristor," IEEE Electron Device Lett., vol. 30, no. 7, pp. 706-708, Jul. 2009.
14. K. Miller, K. S. Nalwa, A. Bergerud, N. M. Neihart and S. Chaudhary, "Memristive Behavior in Thin Anodic Titania," IEEE Electron Device Lett., vol. 31, no. 7, pp. 737-739, Jul. 2010.
15. D. B. Mitzi, Solution Processing of Inorganic Materials, A. John Wiley & sons, Inc., New Jersey NJ, (2009).
16. N. M. Muhammad, S. Sundharam, H-W. Dang, A. Lee, B-H. Ryu, K-H. Choi, "CIS layer deposition through electrospray process for solar cell fabrication," Curr. Appl. Phys., vol. 11, no. 1, pp. s68-s75, Jan. 2011.
17. R. P. A. Hartman, Electrohydrodynamic Atomization in the Cone-jet Mode, Ph.D. Thesis, TU Delft, 1998.
18. H. F. Poon, Electrohydrodynamic Printing, Ph.D. Thesis, Princeton University, 2002.
19. N. M. Muhammad, A. M. Naeem, N. Duraisamy, D. S. Kim, K-H. Choi, "Fabrication of high quality zinc-oxide layers through electrohydrodynamic atomization," Thin Solid Films, vol. 520, pp. 1751, Dec. 2012.
20. N. M. Muhammad, S. Sundharam, H-W. Dang, A. Lee, B-H. Ryu, K-H. Choi, "CIS layer deposition through electrospray process for solar cell fabrication," Curr. Appl. Phys., vol. 11, Nov. 2011.
21. K. Rahman, A. Khan, N.M. Nam, J. D. Jo, K.H. Choi, "Fine Resolution Patterning of Copper Nanoparticles through Electrohydrodynamic Jet Printing," J. Micromech. Microeng, vol. 22, no. 6, May 2012.
22. 2 thin film memristor device using electrohydrodynamic inkjet printing," Thin Solid Films, vol. 520, pp. 5070, May 2012.
23. K. H. Choi, M. Mustafa, K. Rahman, J. B. Ko, Y. H. Doh, "Cost-Effective Fabrication of Memristive devices with ZnO thin film using Printed Electronics Technologies," Appl. Phys. A., vol. 106, no. 1, pp. 165, 2012.