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Volumn , Issue , 2012, Pages 302-305

High temperature behaviour of GaN-on-Si high power MISHEMT devices

Author keywords

[No Author keywords available]

Indexed keywords

ALGAN/GAN; BI-LAYER; DC PARAMETERS; DEVICE PERFORMANCE; HIGH TEMPERATURE; MIS-HEMT; OPERATING CONDITION; TEMPERATURE DEPENDENCE; VDMOS DEVICES;

EID: 84870623913     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2012.6343393     Document Type: Conference Paper
Times cited : (3)

References (12)
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  • 2
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  • 6
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    • Performance of algan/gan heterostructure field effect transistors at higher ambient temperatures
    • M. Florovic, P. Kordos, D. Donoval, D. Gregusova, J. Kovac, "Performance of AlGaN/GaN heterostructure field effect transistors at higher ambient temperatures," J. Electr. Eng. vol. 59 (1), pp. 53-562, 2008
    • (2008) J. Electr. Eng , vol.59 , Issue.1 , pp. 53-562
    • Florovic, M.1    Kordos, P.2    Donoval, D.3    Gregusova, D.4    Kovac, J.5
  • 8
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    • L-Y. Yang, Y. Hao, Xi-H. Ma, J-C. Zhang, C-Y. Pan, J-G. Ma, K. Zhang, and P. Ma, "High temperature characteristics of AlGaN/GaN high electron mobility transistors," Chin. Phys. B Vol. 20 (11), 117302, 2011.
    • (2011) Chin. Phys. B , vol.20 , Issue.11 , pp. 117302
    • Yang, L.-Y.1    Hao, Y.2    Ma, X.-H.3    Zhang, J.-C.4    Pan, C.-Y.5    Ma, J.-G.6    Zhang, K.7    Ma, P.8
  • 9
    • 31544462988 scopus 로고    scopus 로고
    • High temperature characteristics of insulated-gate algan/gan heterostructure field-effect transistors with ultrathin al2o3/si3n4 bilayer
    • C. Wang, N. Maeda, M. Hiroki, T. Kobayashi, and T. Enoki, "High Temperature Characteristics of Insulated-Gate AlGaN/GaN Heterostructure Field-Effect Transistors with Ultrathin Al2O3/Si3N4 Bilayer," Jpn. J. Appl. Phys. , vol. 44, pp. 7889-7891, 2005.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.