Synthesis, phase to phase deposition and characterization of rutile nanocrystalline titanium dioxide (TiO 2 ) thin films

Applied Surface Science

Volumn 264, Issue , 2013, Pages 737-742

  Gupta, Sanjeev K ^a   Singh, Jitendra ^a   Anbalagan, K ^a   Kothari, Prateek ^a   Bhatia, Ravi Raj ^a   Mishra, Pratima K ^b   Manjuladevi, V ^c   Gupta, Raj K ^c   Akhtar, J ^a  

^a CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

^b Surface Engineering Department   (India)

^c BIRLA INSTITUTE OF TECHNOLOGY AND SCIENCE   (India)

Author keywords

e Beam evaporation; Nanocrystalline; Rutile phase; Thin film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DEPOSITION RATES; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN BOUNDARIES; NANOCRYSTALS; OPTICAL PROPERTIES; OXIDE FILMS; OXIDE MINERALS; PHASE TRANSITIONS; PHYSICAL VAPOR DEPOSITION; SILICA; SILICON WAFERS; THIN FILMS; TITANIUM DIOXIDE; TITANIUM OXIDES; ULTRAVIOLET VISIBLE SPECTROSCOPY; X RAY DIFFRACTION;

CONTROLLED DEPOSITION; E BEAM EVAPORATION; GRAZING ANGLE X-RAY DIFFRACTION; NANOCRYSTALLINE TITANIUM DIOXIDE; NANOCRYSTALLINES; RUTILE PHASE; STRUCTURAL CHARACTERIZATION; UV-VISIBLE SPECTROSCOPY;

FILM PREPARATION;

EID: 84870521103     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2012.10.113     Document Type: Article

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