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Volumn 27, Issue 12, 2012, Pages

Photochemical deposition of a p-type transparent alloy semiconductor CuxZnyS

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PARAMETERS; FILM COMPOSITION; NEW ALLOYS; P-TYPE; P-TYPE CONDUCTION; PHOTOCHEMICAL DEPOSITION; PHOTOELECTROCHEMICAL MEASUREMENTS; TRANSPARENT ALLOYS; VISIBLE REGION;

EID: 84870288949     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/27/12/125007     Document Type: Article
Times cited : (26)

References (26)
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    • Preparation and characterization of p-type transparent conducting tin-gallium oxide films
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    • Yldrm, M.A.1
  • 22
    • 15844367672 scopus 로고    scopus 로고
    • 2 thin films from aqueous solutions by novel photochemical deposition technique
    • DOI 10.1016/j.jcrysgro.2004.11.097, PII S0022024804015891, Proceeedings of the 14th International Conference on Crystal Growth and the 12th International Conference on Vapor Growth and Epitaxy
    • Podder J, Miyawaki T and Ichimura M 2005 J. Cryst. Growth 275 e937 (Pubitemid 40421182)
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  • 26


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.