Preparation and some properties of nitrogen-mixed ZnO thin films

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 445-448

  Sato, Yuichi ^a   Sato, Susumu ^a  

^a AKITA UNIVERSITY   (Japan)

Author keywords

Epitaxy; Nitrogen; Plasma processing and deposition; Zinc oxide

Indexed keywords

ALUMINA; ANNEALING; CARRIER CONCENTRATION; DEPOSITION; EPITAXIAL GROWTH; EVAPORATION; FILM PREPARATION; NITROGEN; PHOTOLUMINESCENCE; PLASMAS; THERMAL EFFECTS; ZINC OXIDE;

PLASMA PROCESSING; RADIO FREQUENCY PLASMAS; TRANSMISSION SPECTRA; VAN DER PAUW METHOD;

THIN FILMS;

EID: 0030219326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08671-3     Document Type: Article

References (5)

1. A. Kobayashi, O.F. Sankey, and J.D. Dow, Phys. Rev., B28 (1983) 946.
2. Y. Sato and S. Sato, J. Ceram. Soc. Jpn. Int. Edit., 102 (1994) 375.
3. B.J. Aylett, in J.C. Bailar and A.F. Trotman-Dickenson (eds.), Comprehensive Inorganic Chemistry, Vol. 1, Pergamon, Oxford, 1973, p. 199.
4. Powder diffraction file, International Centre for Diffraction Data, Newtown square, 1993.
5. V. Craciun, J. Elders, J.G.E. Gardeniers and I.W. Boyd, Appl. Phys. Lett., 65 (1994) 2963.