Electrochemical deposition of Cu xS and Cu xZn yS thin films with p-type conduction and photosensitivity

Journal of the Electrochemical Society

Volumn 159, Issue 3, 2012, Pages

  Yang, Kai ^a   Nakashima, Yuki ^a   Ichimura, Masaya ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMICAL DEPOSITION; INDIUM TIN OXIDE COATED GLASS; OPTIMUM CONDITIONS; P-TYPE; P-TYPE CONDUCTION; PHOTOELECTROCHEMICAL MEASUREMENTS; S THIN FILMS; VISIBLE RANGE; WIDE-BAND-GAP SEMICONDUCTOR;

ELECTRODEPOSITION; ENERGY GAP; LACTIC ACID; LIGHT SENSITIVE MATERIALS; PHOTOSENSITIVITY; REDUCTION; SUBSTRATES; TIN; TIN OXIDES; ZINC;

THIN FILMS;

EID: 84857436398     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/2.042203jes     Document Type: Article

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