Fabrication of transparent p-Type CuxZnyS thin films by the electrochemical deposition method

Japanese Journal of Applied Physics

Volumn 50, Issue 4 PART 1, 2011, Pages

  Yang, Kai ^a   Ichimura, Masaya ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AQUEOUS SOLUTIONS; COATED GLASS SUBSTRATES; CURRENT-VOLTAGE MEASUREMENTS; ELECTROCHEMICAL DEPOSITION; ENERGY BANDGAPS; INDIUM TIN OXIDE; OPTICAL TRANSMISSIONS; OPTIMUM CONDITIONS; P-TYPE; P-TYPE CONDUCTION; RECTIFICATION PROPERTIES; S THIN FILMS; ZNO THIN FILM;

DEPOSITION; ELECTRIC RECTIFIERS; ELECTROCHEMICAL SENSORS; ELECTRODEPOSITION; HETEROJUNCTIONS; LIGHT TRANSMISSION; OXIDE FILMS; REDUCTION; SODIUM; SUBSTRATES; THIN FILMS; TIN; TIN OXIDES; VAPOR DEPOSITION; ZINC; ZINC OXIDE;

COPPER;

EID: 79955143328     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.50.040202     Document Type: Article

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