SCOPUS 정보 검색 플랫폼

Volumn 4, Issue 12, 2012, Pages 4368-4372

A deep microfluidic absorbance detection cell replicated from a thickly stacked SU-8 dry film resist mold

(9) Onoshima, Daisuke a Wang, Jun b Aki, Michihiko c Arinaga, Kenji c Kaji, Noritada a Tokeshi, Manabu a,d Fujita, Shozo c Yokoyama, Naoki c Baba, Yoshinobu a,e

a NAGOYA UNIVERSITY (Japan)

b UNIVERSITY OF GOTHENBURG (Sweden)

c FUJITSU LABORATORIES LTD (Japan)

d HOKKAIDO UNIVERSITY (Japan)

e AIST Shikoku (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBANCE DETECTION; ABSORBANCE MEASUREMENTS; ABSORBANCE VALUES; CALIBRATION CURVES; CHANNEL DEPTH; DETECTION LIMITS; DRY FILM RESIST; MICRO-FLOW CELL; MICROFABRICATED; MICROFLUIDIC CHIP; OPTICAL PATH LENGTHS; PDMS CHIPS; POLYDIMETHYLSILOXANE PDMS; RESIST PROCESS; SI WAFER; SOFT LITHOGRAPHY; SOLUTION CONCENTRATION; SUNSET YELLOWS;

MOLDS; SILICON WAFERS;

MICROCHANNELS;

EID: 84870202696 PISSN: 17599660 EISSN: 17599679 Source Type: Journal
DOI: 10.1039/c2ay26099a Document Type: Article

Times cited : (9)

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