Fast prototyping using a dry film photoresist: Microfabrication of soft-lithography masters for microfluidic structures

Journal of Micromechanics and Microengineering

Volumn 17, Issue 10, 2007, Pages

  Stephan, K ^a,b   Pittet, P ^a,b   Renaud, L ^a,b   Kleimann, P ^a,b   Morin, P ^a,b   Ouaini, N ^c   Ferrigno, R ^a,b  

^a UNIVERSITÉ DE LYON   (France)

^b UNIVERSITÉ LYON 1   (France)

^c HOLY SPIRIT UNIVERSITY OF KASLIK USEK   (Lebanon)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; MICROFABRICATION; PHOTORESISTS; SOFTWARE PROTOTYPING; SOLUTION MINING;

BULK SOLUTION; DRY FILMS; LIQUID PHOTORESISTS; MICROFLUIDIC STRUCTURES; SOFT-LITHOGRAPHY;

MICROFLUIDICS;

EID: 34748902473     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/10/N01     Document Type: Article

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