SCOPUS 정보 검색 플랫폼

Volumn , Issue 34, 2012, Pages 5714-5721

Etching silicon with HF-HNO3-H2SO4/H 2O mixtures- unprecedented formation of trifluorosilane, hexafluorodisiloxane, and Si-F surface groups

(7) Lippold, Marcus a Böhme, Uwe a Gondek, Christoph a Kronstein, Martin a Patzig Klein, Sebastian a Weser, Martin a Kroke, Edwin a

a TU BERGAKADEMIE FREIBERG (Germany)

Author keywords

Fluorine; Hydrofluoric acid; Silanes; Silicon; Surface analysis; Wet chemical etching

Indexed keywords

FLUORINE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROFLUORIC ACID; NITRIC ACID; REACTION INTERMEDIATES; SILANES; SULFURIC ACID; SURFACE ANALYSIS; WET ETCHING; X RAY PHOTOELECTRON SPECTROSCOPY;

ACID CONCENTRATIONS; ADDITIONAL REACTIONS; CRYSTALLINE SILICON SURFACES; ETCHING BEHAVIOR; ETCHING MECHANISM; ETCHING RATE; FTIR SPECTROSCOPY; MOLECULAR HYDROGEN; SURFACE GROUPS; WET-CHEMICAL ETCHING;

SILICON;

EID: 84870183751 PISSN: 14341948 EISSN: 10990682 Source Type: Journal
DOI: 10.1002/ejic.201200674 Document Type: Article

Times cited : (29)

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