Real-time, in situ infrared study of etching of Si(100) and (111) surfaces in dilute hydrofluoric acid solution

Journal of Applied Physics

Volumn 79, Issue 7, 1996, Pages 3708-3713

  Niwano, Michio ^a   Miura, Taka Aki ^a   Kimura, Yasuo ^a,b   Tajima, Ryo ^a   Miyamoto, Nobuo ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000715813     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361203     Document Type: Article

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