NOHSO4/HF - A novel etching system for crystalline silicon

Zeitschrift fur Naturforschung - Section B Journal of Chemical Sciences

Volumn 62, Issue 11, 2007, Pages 1411-1421

  Patzig, Sebastian ^a   Roewer, Gerhard ^a   Kroke, Edwin ^a   Röver, Ingo ^b  

^a TU BERGAKADEMIE FREIBERG   (Germany)

^b Deutsche Solar AG   (Germany)

Author keywords

Acidic etching; Mono and multicrystalline silicon; Nitrosyl ion

Indexed keywords

GASES; IONS; MONOCRYSTALLINE SILICON; MORPHOLOGY; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SERVICE INDUSTRY; SILICON COMPOUNDS; SULFURIC ACID; SURFACE MORPHOLOGY;

ACIDIC ETCHINGS; ANISOTROPIC WET CHEMICAL ETCHING; CRYSTALLINE SILICONS; ETCHING SOLUTIONS; FOURIER TRANSFORM INFRA REDS; MONO AND MULTICRYSTALLINE; SELECTIVE SURFACE; SILICON SURFACE MORPHOLOGY;

WET ETCHING;

EID: 35948954765     PISSN: 09320776     EISSN: None     Source Type: Journal    
DOI: 10.1515/znb-2007-1110     Document Type: Article

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