메뉴 건너뛰기




Volumn 23, Issue 49, 2012, Pages

Fabrication of nanobeads from nanocups by controlling scission/crosslinking in organic polymer materials

Author keywords

[No Author keywords available]

Indexed keywords

BULK MATERIALS; CROSSLINKED; FABRICATION TOOL; HIGH DOSE; NANOBEADS; NANOMEMBRANES; ORGANIC MATERIALS; ORGANIC POLYMER MATERIAL; SCANNING BEAMS; SCIENCE AND TECHNOLOGY;

EID: 84870040117     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/49/495307     Document Type: Article
Times cited : (6)

References (31)
  • 7
    • 0032625408 scopus 로고    scopus 로고
    • 10.1117/12.351155 0277-786X
    • Colburn M et al 1999 Proc. SPIE 3676 379-89
    • (1999) Proc. SPIE , vol.3678 , pp. 379-389
    • Colburn, M.1
  • 8
    • 0037142072 scopus 로고    scopus 로고
    • 10.1038/nature00792 0028-0836
    • Chou S Y, Keimel C and Gu J 2002 Nature 417 835
    • (2002) Nature , vol.417 , Issue.6891 , pp. 835
    • Chou, S.Y.1    Keimel, C.2    Gu, J.3
  • 15
    • 17144368056 scopus 로고    scopus 로고
    • 10.1007/b97574 0065-3195
    • Ito H 2005 Adv. Polym. Sci. 172 37
    • (2005) Adv. Polym. Sci. , vol.172 , pp. 37
    • Ito, H.1
  • 17
    • 0021550716 scopus 로고
    • Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist
    • 10.1021/bk-1984-0266.ch005 1947-5918
    • Tabata Y, Tagawa S and Washio M 1984 Pulse radiolysis studies on the mechanism of the high sensitivity of chloromethylated polystyrene as an electron negative resist Materials for Microlithography (ACS Symposium Series) vol 266 ed L F Thompson, C G Willson and J M J Fréchet (Washington, DC: American Chemical Society) pp 151-63
    • (1984) Materials for Microlithography , vol.266 , pp. 151-163
    • Tabata, Y.1    Tagawa, S.2    Washio, M.3
  • 21
    • 79955915123 scopus 로고
    • Main reactions of chlorine-containing and silicon-containing electron and deep-UV (excimer laser) negative resists
    • 10.1021/bk-1987-0346.ch004 1947-5918
    • Tagawa S 1987 Main reactions of chlorine-containing and silicon-containing electron and deep-UV (excimer laser) negative resists Polymers for High Technology (ACS Symposium Series) vol 346 ed M J Bowden and S R Turner (Washington, DC: American Chemical Society) pp 37-45
    • (1987) Polymers for High Technology , vol.346 , pp. 37-45
    • Tagawa, S.1
  • 22
    • 79955890704 scopus 로고
    • Pulse radiolysis studies of polymers
    • 10.1021/bk-1991-0475.ch001 1947-5918
    • Tagawa S 1991 Pulse radiolysis studies of polymers Radiation Effects on Polymers (ACS Symposium Series vol 475) ed R L Clough and S W Shalaby (Washington, DC: American Chemical Society) pp 2-30
    • (1991) Radiation Effects on Polymers , vol.475 , pp. 2-30
    • Tagawa, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.