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Thin Solid Films

Volumn 524, Issue , 2012, Pages 39-43

Effect of low energy ion bombardment on structure and photoluminescence characterization of Al-doped ZnO thin films

(5) Jin, Chenggang a Yu, Tao a Wu, Zaofeng a Wu, Xuemei a Zhuge, Lanjian a

a SOOCHOW UNIVERSITY (China)

Author keywords

Al doped ZnO thin films; Dual ion assisted sputtering deposition; Photoluminescence; Surface morphology

Indexed keywords

AL-DOPED ZINC OXIDE FILMS; AL-DOPED ZNO; ARGON ION BEAM; AZO FILMS; CRYSTALLINE QUALITY; ION BEAM BOMBARDMENT; ION BEAM ENERGY; ION ENERGIES; PHOTOLUMINESCENCE CHARACTERIZATION; PHOTOLUMINESCENCE MEASUREMENTS; RED EMISSIONS; ROOM TEMPERATURE; SPUTTERING DEPOSITION; SUBSTRATE SURFACE; VISIBLE LIGHT EMITTERS; WIDE BAND GAP;

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; ION BEAMS; ION BOMBARDMENT; METALLIC FILMS; OPTICAL FILMS; OXYGEN VACANCIES; PHOTOELECTRONS; PHOTOLUMINESCENCE; SURFACE MORPHOLOGY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ALUMINUM;

EID: 84869503386 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2012.09.055 Document Type: Article

Times cited : (9)

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