State-of-the-art surface passivation of boron emitters using inline PECVD AlOx/SiNx stacks for industrial high-efficiency silicon wafer solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2012, Pages 1036-1039

  Duttagupta, Shubham ^a   Lin, Fen ^a   Shetty, Kishan Devappa ^a   Wilson, Marshall ^b   Ma, Fa Jun ^a   Lin, Jiaji ^a,c   Aberle, Armin G ^a   Hoex, Bram ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b Semilab SDI LLC   (United States)

^c Hanwha SolarOne Co Ltd   (China)

Author keywords

boron emitter; firing activation; industrial PECVD AlOx SiN x stacks; surface passivation

Indexed keywords

EMITTER SATURATION CURRENT DENSITY; FAST FIRING; IDEAL DIODES; INDUSTRIAL PECVD ALOX/SIN X STACKS; INTERFACE DEFECTS; NEGATIVE CHARGE; PLANAR EMITTERS; SURFACE PASSIVATION; THERMAL ACTIVATION;

BORON; OPEN CIRCUIT VOLTAGE; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SILICON WAFERS;

INDUSTRY;

EID: 84869476243     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2012.6317780     Document Type: Conference Paper

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