Study of thin Film Formation From Silicon-Containing Precursors Produced by an RF Non-Thermal Plasma Jet at Atmospheric Pressure

Contributions to Plasma Physics

Volumn 52, Issue 10, 2012, Pages 872-880

  Schafer J ^a   Foest, R ^a   Sigeneger, F ^a   Loffhagen, D ^a   Weltmann, K D ^a   Martens, U ^b   Hippler, R ^b  

^a INP Greifswald   (Germany)

^b UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Atmospheric pressure plasma jet; Fluid modelling; OMCTS; PECVD; SiOx thin films

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; CARBON FILMS; CHEMICAL STABILITY; DEPOSITION RATES; EFFLUENTS; FLOW OF GASES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS SUBSTRATES; LAMINAR FLOW; PLASMA JETS; SILICON; SILICON COMPOUNDS;

ATMOSPHERIC PRESSURE PLASMA JETS; FLUID MODELING; NONTHERMAL PLASMA; OMCTS; ORGANIC FILMS; SIOX THIN FILM; SUBSTRATE SURFACE; THERMAL PLASMA JETS; THIN FILM FORMATION; THIN-FILMS;

THIN FILMS;

EID: 84869021321     PISSN: 08631042     EISSN: 15213986     Source Type: Journal    
DOI: 10.1002/ctpp.201200043     Document Type: Article

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